Mosaic Defects of AlN Buffer Layers in GaN/AlN/4H-SiC Epitaxial Structure
نویسندگان
چکیده
Structural properties of AlN buffer layers, grown by Metal Organic Chemical Vapor Deposition (MOCVD) on 4H-SiC substrate with thicknesses 61.34, 116.88, 129.46 and 131.50 nm, are investigated High Resolution X-Ray Diffraction (HR-XRD) technique. Interfacial roughness layer was determined XRR The interface value nm thick sample is as 0.50 nm. Mosaic defects, tilt angle, vertical lateral coherence lengths characterized HR-XRD edge screw dislocations the found 2.98x1010 8.86x108 cm-2 respectively. results indicate that should be used in order to gain high performance optoelectronic terms this study. Thus, optimization thickness extremely important device performance.
منابع مشابه
Reduction of structural defects in thick 4H-SiC epitaxial layers grown on 4° off-axis substrates
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ژورنال
عنوان ژورنال: Politeknik dergisi
سال: 2021
ISSN: ['1302-0900', '2147-9429']
DOI: https://doi.org/10.2339/politeknik.682649